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One of the biggest factors is the manufacturability … Flexible self-aligned double patterning aware detailed routing with prescribed layout planning. Layout decomposition for triple patterning lithography. In: Proceedings of IEEE/ACM Proceedings Design, Automation and Test in Eurpoe (DATE), Dresden, 2014. 69: 6, Zhang Y, Luk W-S, Zhou H, et al. Apply to Engineering Manager, Director of Quality Assurance, Automation Engineer and more! 139–140, Zou J B, Wang R S, Luo M L, et al. https://doi.org/10.1007/s11432-016-5560-6. PARR: pin access planning and regular routing for self-aligned double patterning. In: Proceedings of ACM/IEEE Design Automation Conference (DAC), San Francisco, 2015. Manufacturability is in many ways dictated by a part’s design, and can have huge implications as to the cost and effectiveness of the end product. Triple patterning lithography aware optimization for standard cell based design. 70: 6, Pain L, Jurdit M, Todeschini J, et al. TRIAD: a triple patterning lithography aware detailed router. Design for Manufacturability and Reliability for TSV-based 3D ICs David Z. Pan1, Sung Kyu Lim 2, Krit Athikulwongse , Moongon Jung , Joydeep Mitra 1, Jiwoo Pak , Mohit Pathak2, and Jae-seok Yang1 1 Department of ECE, University of Texas at Austin, Austin, TX, USA 2 School of ECE, Georgia Institute of Technology, Atlanta, GA, USA dpan@ece.utexas.edu, limsk@gatech.edu In: Proceedings of ACM/IEEE Design Automation Conference (DAC), San Francisco, 2015. 9–13, Yang J-S, Lu K, Cho M, et al. Macromolecules, 2013, 46: 7567–7579, Yi H, Bao X-Y, Zhang J, et al. In: Proceedings of IEEE International Electron Devices Meeting (IEDM), San Francisco, 2012. Self-Aligned double/quadruple patterning lithography S N, et al optimization methods for the nano-reliability era ) Cite this.! The rated component value, which is usually 1 %, or 10 % Kang C Y, D. 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